Extended Editing Framework 1.0.0

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EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts:

  • A runtime containing a set of advanced widgets and a generic and extensible MVC architecture
  • Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated
  • An Acceleo module generating a standard architecture extending the framework's runtime.

The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.

Additional Details

  • Version Number: 1.0.0
  • Eclipse Versions: 3.3 3.4 3.5 3.6 3.7
  • Organization: Obeo
  • Date Created: 11/01/2011
  • Date Updated: 24/08/2011
  • Development Status: Production/Stable
  • License: EPL
  • Submitted by: Obeo Mising name
  • This listing has been installed 6 times in the last 30 days.

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